Microfabrication and Microfluidics

The Microfabrication and Microfluidics Unit of the BEPS Shared Resource specializes in the following:

  • Design, fabrication and implementation of microfluidic devices
  • Rapid turnaround of single or multi-layer templates down to ~1.5 µm lateral dimensions
  • Microfabricated devices made from silicon/glass, PDMS, thermoplastics, and agarose.
  • Structured surface modification, including microcontact printing
  • Developing in vitro platforms that model tissue environments for realistic studies of cellular interactions.  Methods include microfabrication, electrospinning, hydrogel fabrication and characterization, and finite element analysis 

Our goal is close collaboration and rapid, iterative design. Although our preferred mode of operation is to disseminate microfabrication technology by having researchers from other laboratories participate actively in device fabrication, we can make templates and devices if desired.

We are located in Building 13 on the NIH campus.

This is an illustration of a template for SU dash 8 on silicon

This is an illustration of a hydrogel with single wells

This is an illustration of a template for chemotaxis studies

The Microfabrication and Microfluidics Unit has the following capabilities on-campus

  • Contact aligner for wafers up to 4” diameter, lateral resolution down to 1.5 µm.
  • Software for photomask design.
  • Spin-coater for rigid and flexible substrates
  • Protocols for fabrication of
    • SU-8 templates with heights from 1µm to 250µm
    • Dry-film resist templates on flexible substrates
    • PDMS and agarose devices
    • Paper microfluidic devices
  • Plasma cleaner (air or oxygen) for activating polymer surfaces
  • Contact angle measurement
  • Capability for hot embossing thermoplastics
  • Thermal evaporator for metal (Cr/Au, Al) deposition
  • Expertise in implementing flow control (displacement, electokinetic, and pressure) for microfluidic devices

For silicon/glass devices, tight-tolerance features, or high-yield requirements we can use facilities at NIST.

Blackler ARMorgan NYGao BOlano LRArmani MDRomantseva EKakareka JWBonner RFMukherjee SXiao BTran KPohida TJEmmert-Buck MRTangrea MAMarkey SP
Anal. Chem.
2013 Aug 06

Wen HWolfe DEGomella AAMiao HXiao XLiu CLynch SKMorgan N
Rev Sci Instrum
2013 Jan

Lynch SKLiu CMorgan NYXiao XGomella AAMazilu DBennett EEAssoufid Lde Carlo FWen H
J Micromech Microeng
2012 Oct

Chikkaveeraiah BVBhirde AAMorgan NYEden HSChen X
ACS Nano
2012 Aug 28

Zubair ABurbelo PDVincent LGIadarola MJSmith PDMorgan NY
Biomed Microdevices
2011 Dec

Kakareka JWMcCann TEKosaka NMitsunaga MMorgan NYPohida TJChoyke PLKobayashi H
Mol Imaging Biol
2011 Oct

Morgan NYEnglish SChen WChernomordik VRusso ASmith PDGandjbakhche A
Acad Radiol
2005 Mar